An apparatus, system, and method are disclosed for guided growth of patterned media using monodisperse nanospheres. The apparatus includes nanoscale features extending from a substrate. The nanoscale features may be formed using electron-beam lithography and have a non-uniform cap. A spherical cap is formed on the non-uniform cap by hydrolysis and precipitation of monodisperse nanospheres on an immobilized nucleation site, the immobilized nucleation site attached with one end of the nanoscale feature. The system includes the apparatus and further includes monodisperse nanospheres formed of silicon dioxide spheres. The method includes providing a substrate, etching at least one nanoscale feature extending from the substrate, the feature formed using electron-beam lithography and having a non-uniform cap, forming an immobilized nucleation site, and forming a spherical cap by hydrolysis and precipitation of monodisperse nanospheres on the immobilized nucleation site, the immobilized nucleation site attached with one end of the nanoscale feature.