Invention Grant
- Patent Title: Optical apparatus, lithographic apparatus and device manufacturing method
- Patent Title (中): 光学设备,光刻设备和器件制造方法
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Application No.: US11643955Application Date: 2006-12-22
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Publication No.: US07935218B2Publication Date: 2011-05-03
- Inventor: Johannes Hubertus Josephina Moors , Vadim Yevgenyevich Banine , Bastiaan Theodoor Wolschrijn , Carolus Ida Maria Antonius Spee , Rik Jansen
- Applicant: Johannes Hubertus Josephina Moors , Vadim Yevgenyevich Banine , Bastiaan Theodoor Wolschrijn , Carolus Ida Maria Antonius Spee , Rik Jansen
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: C23F1/00
- IPC: C23F1/00

Abstract:
An optical apparatus includes an illumination system configured to form a pulsed radiation beam, an optical element with a surface on which the radiation beam is incident in operation, and a gas source arranged to supply a mixture of a first type of gas and a second type of gas to a space adjacent the surface. Particles of the first and second types of gas are capable of reacting with the surface, when activated by the radiation beam. The gas source is configured to generate a combination of surface occupation numbers of molecules of the first and second types of gas on the surface under operating conditions, at least prior to pulses of the radiation beam, the combination of surface occupation numbers lying in a range in which reactions of particles with the surface during pulses of the radiation beam are in majority reversed.
Public/Granted literature
- US20070158579A1 Optical apparatus, lithographic apparatus and device manufacturing method Public/Granted day:2007-07-12
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