Invention Grant
- Patent Title: Method of manufacturing fine patterns
- Patent Title (中): 制作精细图案的方法
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Application No.: US11987067Application Date: 2007-11-27
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Publication No.: US07935262B2Publication Date: 2011-05-03
- Inventor: Yoshihide Nagata , Atsushi Sato , Hitomu Watanabe , Ji Woo Kim
- Applicant: Yoshihide Nagata , Atsushi Sato , Hitomu Watanabe , Ji Woo Kim
- Applicant Address: KR Gumi-si, Gyeongsangbuk-do
- Assignee: Cheil Industries, Inc.
- Current Assignee: Cheil Industries, Inc.
- Current Assignee Address: KR Gumi-si, Gyeongsangbuk-do
- Agency: Lee & Morse, P.C.
- Priority: JP2006-319758 20061128
- Main IPC: C23F1/00
- IPC: C23F1/00

Abstract:
A method of manufacturing fine patterns includes providing a base portion having a plurality of protruding portions with recess portions therebetween, depositing a material layer on the protruding portions, the material layer including grooves in an upper surface thereof and a plurality of material portions on respective protruding portions, the material portions being in direct contact with adjacent material portions to form contact surfaces therebetween and to overhang corresponding recess portions between the adjacent material portions, and wet etching the material portions through the grooves and contact surfaces to form pattern portions.
Public/Granted literature
- US20080121610A1 Method of manufacturing fine patterns Public/Granted day:2008-05-29
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