Invention Grant
- Patent Title: Photo-curable resin composition and a method for forming a pattern using the same
- Patent Title (中): 光固化树脂组合物和使用其形成图案的方法
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Application No.: US11523559Application Date: 2006-09-20
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Publication No.: US07935472B2Publication Date: 2011-05-03
- Inventor: Masahiko Ogino , Ken Sawabe , Makoto Kaji , Hanako Yori
- Applicant: Masahiko Ogino , Ken Sawabe , Makoto Kaji , Hanako Yori
- Applicant Address: JP Tokyo
- Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2005-272756 20050920
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/26
Abstract:
Provided is a new photo-curable resin composition which can be used in a photo nanoimprinting technology available for a photo nanoimprinting technology by which a substrate is processed with high accuracy. The photo-curable resin composition contains a photo-curable resin material essentially containing a (meth)acrylate, a reactive diluent, and a photo initiator. Preferably, the (meth)acrylate has a structure containing a benzene ring structure in its skeleton.
Public/Granted literature
- US20070065757A1 Photo-curable resin composition and a method for forming a pattern using the same Public/Granted day:2007-03-22
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