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US07935473B2 Photosensitive composition, lithographic printing plate precursor, lithographic printing method, and novel cyanine dyes 有权
光敏组合物，平版印刷版前体，平版印刷法和新颖的花青染料

  • Patent Title: Photosensitive composition, lithographic printing plate precursor, lithographic printing method, and novel cyanine dyes
  • Patent Title (中): 光敏组合物，平版印刷版前体，平版印刷法和新颖的花青染料
  • Application No.: US12026864
    Application Date: 2008-02-06
  • Publication No.: US07935473B2
    Publication Date: 2011-05-03
  • Inventor: Yu Iwai
  • Applicant: Yu Iwai
  • Applicant Address: JP Tokyo
  • Assignee: FUJIFILM Corporation
  • Current Assignee: FUJIFILM Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Sughrue Mion, PLLC
  • Priority: JP2007-026692 20070206
  • Main IPC: G03F7/038
  • IPC: G03F7/038
Photosensitive composition, lithographic printing plate precursor, lithographic printing method, and novel cyanine dyes
Abstract:
A photosensitive composition includes a cyanine dye that has, on a methine chain thereof, a substituent which is a cation moiety of an onium salt structure.
Abstract(Chinese):

光敏组合物包括在其次甲基链上具有鎓盐结构的阳离子部分的取代基的花青染料。

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