Invention Grant
- Patent Title: Fabrication method of pixel structure
- Patent Title (中): 像素结构的制作方法
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Application No.: US11951321Application Date: 2007-12-05
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Publication No.: US07935583B2Publication Date: 2011-05-03
- Inventor: Shiun-Chang Jan , Han-Tu Lin
- Applicant: Shiun-Chang Jan , Han-Tu Lin
- Applicant Address: TW Science-Based Industrial Park, Hsin-Chu
- Assignee: AU Optronics Corp.
- Current Assignee: AU Optronics Corp.
- Current Assignee Address: TW Science-Based Industrial Park, Hsin-Chu
- Agent Winston Hsu; Scott Margo
- Priority: TW96140324A 20071026
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/84
Abstract:
A fabrication method of a pixel structure includes utilizing only a single photomask in two different lithographic processes for defining patterns of the source/drain and passivation layer respectively. Therefore, the total amount of photomasks of the fabrication process can be decreased.
Public/Granted literature
- US20090108280A1 PIXEL STRUCTURE AND FABRICATION METHOD THEREOF Public/Granted day:2009-04-30
Information query
IPC分类:
