Invention Grant
- Patent Title: Non-corrosive cleaning compositions for removing etch residues
- Patent Title (中): 用于去除蚀刻残留物的非腐蚀性清洁组合物
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Application No.: US10421506Application Date: 2003-04-24
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Publication No.: US07935665B2Publication Date: 2011-05-03
- Inventor: Vincent G. Leon , Michelle Elderkin , Lawrence Ferreira
- Applicant: Vincent G. Leon , Michelle Elderkin , Lawrence Ferreira
- Applicant Address: US RI North Kingstown
- Assignee: Fujifilm Electronic Materials U.S.A., Inc.
- Current Assignee: Fujifilm Electronic Materials U.S.A., Inc.
- Current Assignee Address: US RI North Kingstown
- Agency: Fish & Richardson P.C.
- Main IPC: C11D1/00
- IPC: C11D1/00 ; C11D3/20 ; C11D3/26 ; C11D3/43
Abstract:
A non-corrosive cleaning composition that is aqueous-based, non-hazardous and will not harm the environment and is useful primarily for removing both fresh and aged plasma etch residues from a substrate. The composition comprises (a) water; and (b) a synergistic combination of at least one tricarboxylic acid and at least one carboxylic acid. Preferably, the at least one carboxylic acid has a pKa value ranging from 3 to 6. Also, a method for removing etch residues from a substrate. The method includes the steps of (a) providing a substrate with etch residue; and (b) contacting the substrate with a cleaning composition comprising water; and a synergistic combination of at least one tricarboxylic acid and at least one carboxylic acid.
Public/Granted literature
- US20030235996A1 Non-corrosive cleaning compositions for removing etch residues Public/Granted day:2003-12-25
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