Invention Grant
- Patent Title: Radiation curable and developable polyurethane and radiation curable and developable photo resist composition containing the same
- Patent Title (中): 含可辐射固化和显影的聚氨酯和可辐射固化和显影的光致抗蚀剂组合物
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Application No.: US12076597Application Date: 2008-03-20
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Publication No.: US07935776B2Publication Date: 2011-05-03
- Inventor: Wei Hsiang Huang , Ying Jen Chen , Jui Ming Chang , Chun Hung Kuo , Hong Ye Lin , Li Chung Chang
- Applicant: Wei Hsiang Huang , Ying Jen Chen , Jui Ming Chang , Chun Hung Kuo , Hong Ye Lin , Li Chung Chang
- Applicant Address: TW Taipei
- Assignee: AGI Corporation
- Current Assignee: AGI Corporation
- Current Assignee Address: TW Taipei
- Agency: Muncy, Geissler, Olds & Lowe, PLLC
- Priority: TW96109678A 20070321; TW97102304A 20080122
- Main IPC: C08G18/06
- IPC: C08G18/06 ; C08G18/00 ; C08G18/18 ; C08F2/50 ; C08F2/46

Abstract:
The present invention relates to a radiation curable and developable polyurethane which is characterized by having a carboxy group in its main chain and a acryloyl group in its side chain and comprising the following repeat units (I), (II), and (II) in a random arrangement: wherein R1, R2, R3, R4, and T are defined in the specification. The polyurethane has a weight molecular weight measured by GPC in a range of from 3,000 to 400,000; an acid value in a range of from 5 to 120 mgKOH/g. The present invention also relates to a radiation curable and developable composition containing the polyurethane.
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