Invention Grant
US07935948B2 Method and apparatus for monitoring and control of suck back level in a photoresist dispense system
有权
用于在光刻胶分配系统中监测和控制吸回水平的方法和装置
- Patent Title: Method and apparatus for monitoring and control of suck back level in a photoresist dispense system
- Patent Title (中): 用于在光刻胶分配系统中监测和控制吸回水平的方法和装置
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Application No.: US11691468Application Date: 2007-03-26
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Publication No.: US07935948B2Publication Date: 2011-05-03
- Inventor: Erica R. Porras , Natarajan Ramanan
- Applicant: Erica R. Porras , Natarajan Ramanan
- Applicant Address: JP Kyoto
- Assignee: Sokudo Co., Ltd.
- Current Assignee: Sokudo Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: G01N15/06
- IPC: G01N15/06 ; G01N21/00 ; G01F23/00

Abstract:
An apparatus for monitoring a position of a semiconductor process fluid interface in a dispense nozzle includes an extended optical source adapted to provide an optical beam propagating along an optical path. The optical beam is characterized by a path width measured in a first direction aligned with a dispense direction. The apparatus also includes an optical detector coupled to the optical path and adapted to detect at least a portion of the optical beam and a dispense nozzle disposed along the optical path at a location between the extended optical source and the optical detector. The apparatus further includes a nozzle positioning member coupled to the dispense nozzle and adapted to translate the dispense nozzle in the first direction.
Public/Granted literature
- US20080035666A1 METHOD AND APPARATUS FOR MONITORING AND CONTROL OF SUCK BACK LEVEL IN A PHOTORESIST DISPENSE SYSTEM Public/Granted day:2008-02-14
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