Invention Grant
US07935948B2 Method and apparatus for monitoring and control of suck back level in a photoresist dispense system 有权
用于在光刻胶分配系统中监测和控制吸回水平的方法和装置

Method and apparatus for monitoring and control of suck back level in a photoresist dispense system
Abstract:
An apparatus for monitoring a position of a semiconductor process fluid interface in a dispense nozzle includes an extended optical source adapted to provide an optical beam propagating along an optical path. The optical beam is characterized by a path width measured in a first direction aligned with a dispense direction. The apparatus also includes an optical detector coupled to the optical path and adapted to detect at least a portion of the optical beam and a dispense nozzle disposed along the optical path at a location between the extended optical source and the optical detector. The apparatus further includes a nozzle positioning member coupled to the dispense nozzle and adapted to translate the dispense nozzle in the first direction.
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