Invention Grant
- Patent Title: Multi-layered bipolar field-effect transistor and method of manufacturing the same
- Patent Title (中): 多层双极场效应晶体管及其制造方法
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Application No.: US11976090Application Date: 2007-10-19
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Publication No.: US07935961B2Publication Date: 2011-05-03
- Inventor: Sang Yoon Lee , Alan J. Heeger , Kwang Hee Lee , Shinuk Cho
- Applicant: Sang Yoon Lee , Alan J. Heeger , Kwang Hee Lee , Shinuk Cho
- Applicant Address: KR Gyeonngi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonngi-do
- Agency: Harness, Dickey & Pierce, PLC
- Main IPC: H01L51/05
- IPC: H01L51/05

Abstract:
Disclosed herein is a multi-layered bipolar field-effect transistor, including a gate electrode, a gate insulating layer, an electron transport layer, a hole transport layer, a source electrode, and a drain electrode, in which an intermediate separating layer is formed between the electron transport layer and the hole transport layer, and a method of manufacturing the same. The multi-layered bipolar field-effect transistor has advantages in that, since a P-channel and a N-channel are effectively separated, the electrical properties thereof, such as current ON/OFF ratio, electron mobility, hole mobility, and the like, are improved, and, since a device can be manufactured through a solution process without damaging layers, the processability thereof is improved.
Public/Granted literature
- US20090101891A1 Multi-layered bipolar field-effect transistor and method of manufacturing the same Public/Granted day:2009-04-23
Information query
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