Invention Grant
- Patent Title: Compound semiconductor epitaxial substrate and method for producing the same
- Patent Title (中): 化合物半导体外延基板及其制造方法
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Application No.: US12227794Application Date: 2007-05-28
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Publication No.: US07935984B2Publication Date: 2011-05-03
- Inventor: Tsuyoshi Nakano
- Applicant: Tsuyoshi Nakano
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Fitch, Even, Tabin & Flannery
- Priority: JP2006-150768 20060531
- International Application: PCT/JP2007/061236 WO 20070528
- International Announcement: WO2007/139218 WO 20071206
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
There are provided a higher-performance compound semiconductor epitaxial substrate having improved electron mobility characteristics and its production method. The compound semiconductor epitaxial substrate includes a channel layer in which electrons travel and an epitaxial layer on each of a front side and a back side of the channel layer, wherein a total p-type carrier concentration A (/cm2) per unit area in the epitaxial layer on the back side of the channel layer and a total p-type carrier concentration B (/cm2) per unit area in the epitaxial layer on the front side of the channel layer satisfy the following expression (1): 0
Public/Granted literature
- US20090166642A1 Compound semiconductor epitaxial substrate and method for producing the same Public/Granted day:2009-07-02
Information query
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