Invention Grant
US07936003B2 Semiconductor device having transistor with vertical gate electrode and method of fabricating the same
失效
具有具有垂直栅电极的晶体管的半导体器件及其制造方法
- Patent Title: Semiconductor device having transistor with vertical gate electrode and method of fabricating the same
- Patent Title (中): 具有具有垂直栅电极的晶体管的半导体器件及其制造方法
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Application No.: US11344560Application Date: 2006-01-31
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Publication No.: US07936003B2Publication Date: 2011-05-03
- Inventor: Sang-Woo Kang , Jeong-Uk Han , Yong-Tae Kim , Seung-Beom Yoon
- Applicant: Sang-Woo Kang , Jeong-Uk Han , Yong-Tae Kim , Seung-Beom Yoon
- Applicant Address: KR Suwon-Si, Gyeonggi-Do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-Si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2005-0010056 20050203; KR10-2005-0066383 20050721
- Main IPC: H01L29/788
- IPC: H01L29/788

Abstract:
A semiconductor device includes transistors with a vertical gate electrode. In a transistor structure, a semiconductor pattern has first and second sides facing in a transverse direction, and third and fourth sides facing in a longitudinal direction. Gate patterns are disposed adjacent to the first and second sides of the semiconductor pattern. Impurity patterns directly contact the third and fourth sides of the semiconductor pattern. A gate insulating pattern is interposed between the gate patterns and the semiconductor pattern.
Public/Granted literature
- US20060170031A1 Semiconductor device having transistor with vertical gate electrode and method of fabricating the same Public/Granted day:2006-08-03
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