Invention Grant
US07936006B1 Semiconductor device with backfilled isolation 有权
具有回填隔离的半导体器件

Semiconductor device with backfilled isolation
Abstract:
An MOS device has an embedded dielectric structure underlying an active portion of the device, such as a source extension or a drain extension. In an alternative embodiment, an embedded dielectric structure underlies the channel region of a MOS device, as well as the source and drain extensions.
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