Invention Grant
US07936008B2 Structure and method for forming accumulation-mode field effect transistor with improved current capability
有权
用于形成具有改善的电流能力的积聚型场效应晶体管的结构和方法
- Patent Title: Structure and method for forming accumulation-mode field effect transistor with improved current capability
- Patent Title (中): 用于形成具有改善的电流能力的积聚型场效应晶体管的结构和方法
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Application No.: US12114575Application Date: 2008-05-02
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Publication No.: US07936008B2Publication Date: 2011-05-03
- Inventor: Praveen Muraleedharan Shenoy
- Applicant: Praveen Muraleedharan Shenoy
- Applicant Address: US ME South Portland
- Assignee: Fairchild Semiconductor Corporation
- Current Assignee: Fairchild Semiconductor Corporation
- Current Assignee Address: US ME South Portland
- Agency: Kilpatrick Townsend & Stockton
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L29/76

Abstract:
An accumulation-mode field effect transistor includes a drift region of a first conductivity type, channel regions of the first conductivity type over and in contact with the drift region, and gate trenches having sidewalls abutting the channel regions. The gate trenches extend into and terminate within the drift region. The transistor further includes a first plurality of silicon regions of a second conductivity type forming P-N junctions with the channel regions along vertical walls of the first plurality of silicon regions. The first plurality of silicon regions extend into the drift region and form P-N junctions with the drift region along bottoms of the first plurality of silicon regions.
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