Invention Grant
- Patent Title: Integrated circuit devices including passive device shielding structures
- Patent Title (中): 集成电路器件包括无源器件屏蔽结构
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Application No.: US12830627Application Date: 2010-07-06
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Publication No.: US07936046B2Publication Date: 2011-05-03
- Inventor: Chulho Chung
- Applicant: Chulho Chung
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec
- Priority: KR10-2004-0061159 20040803
- Main IPC: H01L27/08
- IPC: H01L27/08

Abstract:
Integrated circuit devices include a semiconductor substrate and a flux line generating passive electronic element on the semiconductor substrate. A dummy gate structure is arranged on the semiconductor substrate in a region below the passive electronic element. The dummy gate includes a plurality of segments, each segment including a first longitudinally extending part and a second longitudinally extending part. The second longitudinally extending part extends at an angle from an end of the first longitudinally extending part. Ones of the segments extend at a substantially same angle and are arranged displaced from each other in an adjacent nested relationship.
Public/Granted literature
- US20100264513A1 INTEGRATED CIRCUIT DEVICES INCLUDING PASSIVE DEVICE SHIELDING STRUCTURES Public/Granted day:2010-10-21
Information query
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