Invention Grant
- Patent Title: Semiconductor devices and method of manufacturing them
- Patent Title (中): 半导体器件及其制造方法
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Application No.: US11808465Application Date: 2007-06-11
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Publication No.: US07936065B2Publication Date: 2011-05-03
- Inventor: Yoshihito Mizuno , Masahiro Kinokuni , Shinji Koike , Masahiro Matsumoto , Fumitsugu Yanagihori
- Applicant: Yoshihito Mizuno , Masahiro Kinokuni , Shinji Koike , Masahiro Matsumoto , Fumitsugu Yanagihori
- Applicant Address: JP Toyota-shi, Aichi-ken JP Kanagawa-ken
- Assignee: Toyota Jidosha Kabushiki Kaisha,ULVAC, Inc.
- Current Assignee: Toyota Jidosha Kabushiki Kaisha,ULVAC, Inc.
- Current Assignee Address: JP Toyota-shi, Aichi-ken JP Kanagawa-ken
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Priority: JP2006-161931 20060612
- Main IPC: H01L23/48
- IPC: H01L23/48

Abstract:
A semiconductor device is provided with a silicon substrate, with a surface for soldering the silicon substrate to a ceramic substrate, and an electrode making contact with the surface of the silicon substrate. The electrode comprises a first conductor layer, a second conductor layer, and a third conductor layer. The first conductor layer makes contact with the surface of the silicon substrate and includes aluminum and silicon. The second conductor layer makes contact with the first conductor layer and includes titanium. The third conductor layer is separated from the first conductor layer by the second conductor layer and includes nickel.
Public/Granted literature
- US20070296080A1 Semiconductor devices and method of manufacturing them Public/Granted day:2007-12-27
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