Invention Grant
- Patent Title: Projection optical system, exposure apparatus, and exposure method
- Patent Title (中): 投影光学系统,曝光装置和曝光方法
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Application No.: US11920331Application Date: 2006-05-08
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Publication No.: US07936441B2Publication Date: 2011-05-03
- Inventor: Yasuhiro Omura
- Applicant: Yasuhiro Omura
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Klarquist Sparkman, LLP
- Priority: JP2005-139343 20050512
- International Application: PCT/JP2006/309253 WO 20060508
- International Announcement: WO2006/121008 WO 20061116
- Main IPC: B60R1/06
- IPC: B60R1/06 ; G02B7/02 ; G03B27/42 ; G03B27/52 ; G03B27/54

Abstract:
An immersion projection optical system that prevents leakage of a liquid (immersion liquid) into the optical system and maintains satisfactory imaging capability. The projection optical system of the present invention is a projection optical system that projects a reduced image of a first plane onto a second plane through a liquid. The projection optical system includes an interface optical lens (Lb) having a side towards the first plane that contacts a gas and a side towards the second plane that contacts the liquid. The interface optical element includes a light entering surface (Lba), which has a convex shape facing towards the first plane, and a groove (Gr), which is formed to surround an effective region in a light emitting surface of the interface optical element.
Public/Granted literature
- US20090092925A1 Projection optical system, exposure apparatus, and exposure method Public/Granted day:2009-04-09
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