Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US11430181Application Date: 2006-05-09
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Publication No.: US07936443B2Publication Date: 2011-05-03
- Inventor: Hans Butler , Frank Auer
- Applicant: Hans Butler , Frank Auer
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03B27/42
- IPC: G03B27/42
Abstract:
Data from the piezo-electric sensors in the mounts for the projection system can be used in the control loops for other parts of the lithographic apparatus, for example the mask table, the substrate table or the air mounts for the frame bearing the projection system. Information from, for example, a geophone, which is used to measure the absolute velocity of the frame bearing the projection system, can be used in the control loop for the piezo-electric actuator in the mount for the projection system.
Public/Granted literature
- US20070263189A1 Lithographic apparatus and device manufacturing method Public/Granted day:2007-11-15
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