Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
-
Application No.: US11429451Application Date: 2006-05-08
-
Publication No.: US07936447B2Publication Date: 2011-05-03
- Inventor: Antonius Theodorus Anna Maria Derksen , Erik Marie José Smeets , David Christopher Ockwell , Henricus Jozef Peter Lenders
- Applicant: Antonius Theodorus Anna Maria Derksen , Erik Marie José Smeets , David Christopher Ockwell , Henricus Jozef Peter Lenders
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/58
- IPC: G03B27/58 ; H01L21/76
Abstract:
A masking apparatus for preventing irradiation of an outer region of a substrate during lithography is disclosed. The masking apparatus includes a mask that includes a plurality of discrete segments arranged to form a continuous ring shaped mask positioned between an outer region of a substrate and an illumination system.
Public/Granted literature
- US20070258076A1 Lithographic apparatus and device manufacturing method Public/Granted day:2007-11-08
Information query
