Invention Grant
- Patent Title: Inspection apparatus, exposure apparatus, and method of manufacturing device
- Patent Title (中): 检查装置,曝光装置及其制造方法
-
Application No.: US12505530Application Date: 2009-07-20
-
Publication No.: US07936452B2Publication Date: 2011-05-03
- Inventor: Atsushi Kawahara
- Applicant: Atsushi Kawahara
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc., IP Division
- Priority: JP2008-192686 20080725
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
An inspection apparatus includes a projecting unit, a first receiving unit, a second receiving unit, and a controller. The projection unit is configured to project linear light on a surface of an object. The first and second receiving units are configured to receive scattered light of the projected linear light. The controller is configured to scan the projecting unit, the first and second receiving units and determine the present or absence of a foreign substance on the surface based on intensity distribution signals output from the first and second receiving units.
Public/Granted literature
- US20100020316A1 INSPECTION APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE Public/Granted day:2010-01-28
Information query