Invention Grant
- Patent Title: Reducing drift in chalcogenide devices
- Patent Title (中): 减少硫族化物装置中的漂移
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Application No.: US12082070Application Date: 2008-04-08
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Publication No.: US07936593B2Publication Date: 2011-05-03
- Inventor: Semyon D. Savransky
- Applicant: Semyon D. Savransky
- Applicant Address: US MI Troy
- Assignee: Ovonyx, Inc.
- Current Assignee: Ovonyx, Inc.
- Current Assignee Address: US MI Troy
- Agency: Trop, Pruner & Hu, P.C.
- Main IPC: G11C11/00
- IPC: G11C11/00 ; H01L47/00

Abstract:
Chalcogenide materials conventionally used in chalcogenide memory devices and ovonic threshold switches may exhibit a tendency called drift, wherein threshold voltage or resistance changes with time. By providing a compensating material which exhibits an opposing tendency, the drift may be compensated. The compensating material may be mixed into a chalcogenide, may be layered with chalcogenide, may be provided with a heater, or may be provided as part of an electrode in some embodiments. Both chalcogenide and non-chalcogenide compensating materials may be used.
Public/Granted literature
- US20090250677A1 Reducing drift in chalcogenide devices Public/Granted day:2009-10-08
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