Invention Grant
US07936611B2 Memory device and method of operating and fabricating the same 有权
存储器件及其操作和制造方法

Memory device and method of operating and fabricating the same
Abstract:
A memory transistor including a substrate, a tunnel insulating pattern on the substrate, a charge storage pattern on the tunnel insulating pattern, a blocking insulating pattern on the charge storage pattern, and a gate electrode on the blocking insulating pattern, the blocking insulating pattern surrounding the gate electrode and methods of operating and fabricating the same. A nonvolatile memory may further include a plurality of memory transistors in series and a plurality of auxiliary structures between each of the plurality of unit transistors in series. Each of the plurality of auxiliary structures may be a dummy mask pattern or an assistant gate structure.
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