Invention Grant
- Patent Title: Memory device and method of operating and fabricating the same
- Patent Title (中): 存储器件及其操作和制造方法
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Application No.: US12659159Application Date: 2010-02-26
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Publication No.: US07936611B2Publication Date: 2011-05-03
- Inventor: Chang-Hyun Lee , Byeong-In Choi
- Applicant: Chang-Hyun Lee , Byeong-In Choi
- Applicant Address: KR Gyeonggi-Do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-Do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2006-0108528 20061103; KR10-2007-0014989 20070213
- Main IPC: G11C11/34
- IPC: G11C11/34

Abstract:
A memory transistor including a substrate, a tunnel insulating pattern on the substrate, a charge storage pattern on the tunnel insulating pattern, a blocking insulating pattern on the charge storage pattern, and a gate electrode on the blocking insulating pattern, the blocking insulating pattern surrounding the gate electrode and methods of operating and fabricating the same. A nonvolatile memory may further include a plurality of memory transistors in series and a plurality of auxiliary structures between each of the plurality of unit transistors in series. Each of the plurality of auxiliary structures may be a dummy mask pattern or an assistant gate structure.
Public/Granted literature
- US20100157668A1 Memory device and method of operating and fabricating the same Public/Granted day:2010-06-24
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