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US07936959B2 Apparatus for focusing plasmon waves 有权
用于聚焦等离子体波的装置

Apparatus for focusing plasmon waves
Abstract:
An apparatus comprises a thin film metallic layer, a first dielectric layer arranged on a first side of said thin film metallic layer and having a first index of refraction, a second dielectric layer arranged on a side of the first dielectric layer opposite of said thin film metallic layer from said first dielectric layer, the second dielectric layer having a second index of refraction that is higher than the first index of refraction; and wherein the thin film metallic layer, the first dielectric layer and the second dielectric layer are arranged in a conical shape to direct plasmon waves induced at an interface between the thin film metallic layer and the first dielectric layer to an aperture.
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