Invention Grant
- Patent Title: Ventilated front-opening unified pod
- Patent Title (中): 通风前开口统一吊舱
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Application No.: US12268632Application Date: 2008-11-11
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Publication No.: US07938269B2Publication Date: 2011-05-10
- Inventor: Hsiao-Chyang Liu
- Applicant: Hsiao-Chyang Liu
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Duane Morris LLP
- Main IPC: B65D85/00
- IPC: B65D85/00

Abstract:
An improved substrate transport pod for storing or transporting semiconductor wafer substrates during semiconductor wafer processing has a main body defined by a plurality of side panels. A substantial portion of at least one of the side panels being formed of a semi-permeable membrane allowing any corrosive gas molecules introduced to the interior of the pod to diffuse out of the transport pod through the semi-permeable membrane while preventing particulate contaminants from entering the transport pod.
Public/Granted literature
- US20100116709A1 VENTILATED FRONT-OPENING UNIFIED POD Public/Granted day:2010-05-13
Information query
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