Invention Grant
US07939241B2 (Meth)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method
失效
（甲基）丙烯酰胺衍生物，聚合物，化学增幅感光性树脂组合物和图案化方法
- Patent Title: (Meth)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method
- Patent Title (中): （甲基）丙烯酰胺衍生物，聚合物，化学增幅感光性树脂组合物和图案化方法
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Application No.: US11919891Application Date: 2006-05-12
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Publication No.: US07939241B2Publication Date: 2011-05-10
- Inventor: Katsumi Maeda , Kaichirou Nakano
- Applicant: Katsumi Maeda , Kaichirou Nakano
- Applicant Address: JP Tokyo
- Assignee: NEC Corporation
- Current Assignee: NEC Corporation
- Current Assignee Address: JP Tokyo
- Agency: Young & Thompson
- Priority: JP2005-141070 20050513
- International Application: PCT/JP2006/309540 WO 20060512
- International Announcement: WO2006/121150 WO 20061116
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/20 ; G03F7/30 ; G03F7/38 ; G03F7/40
Abstract:
The present invention relates to a novel (meth)acrylamide compound represented by the general formula (1), a (co)polymer of the (meth)acrylamide compound, and a chemically amplified photosensitive resin composition composed of the polymer and a photoacid generator. In the formula, R1 represents a hydrogen atom or a methyl group; R2 represents an acid-decomposable group; and R3 to R6 independently represent a hydrogen atom, a halogen atom or an alkyl group having 1 to 4 carbon atoms.
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