Invention Grant
- Patent Title: High-voltage transistor having shielding gate
- Patent Title (中): 具有屏蔽门的高电压晶体管
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Application No.: US11510584Application Date: 2006-08-28
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Publication No.: US07939908B2Publication Date: 2011-05-10
- Inventor: Hiroyuki Kutsukake , Kikuko Sugimae , Takeshi Kamigaichi
- Applicant: Hiroyuki Kutsukake , Kikuko Sugimae , Takeshi Kamigaichi
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2004-239593 20040819
- Main IPC: H01L21/76
- IPC: H01L21/76

Abstract:
A semiconductor device includes a plurality of high-voltage insulated-gate field-effect transistors arranged in a matrix form on the main surface of a semiconductor substrate and each having a gate electrode, a gate electrode contact formed on the gate electrode, and a wiring layer which is formed on the gate electrode contacts adjacent in a gate-width direction to electrically connect the gate electrodes arranged in the gate-width direction. And the device includes shielding gates provided on portions of an element isolation region which lie between the transistors adjacent in the gate-width direction and gate-length direction and used to apply reference potential or potential of a polarity different from that of potential applied to the gate of the transistor to turn on the current path of the transistor to the element isolation region.
Public/Granted literature
- US20070013024A1 High-voltage transistor having shielding gate Public/Granted day:2007-01-18
Information query
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