An apparatus for drafting a framework for a pattern and a method of using the apparatus is presented. The apparatus includes a generally rigid planer structure. A pivot point includes a pivot point aperture extending through the rigid planer structure for enabling scribing a center point of the framework and rotating the rigid planer structure about the center point. A plurality of lines pass through the pivot point. Each of the plurality of lines includes a plurality of apertures for enabling scribing marks for forming a basis for lines in the framework. At least one line of generally equally spaced longitudinal apertures, wherein each of the longitudinal apertures is at a first fixed radial distance from the pivot point, enables scribing a circle for the framework, where the circle is scribed by rotation of the rigid planer structure about the pivot point.