Invention Grant
US07946303B2 Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus
失效
用于减少基板处理弯月面留下的入口和/或出口痕迹的载体
- Patent Title: Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus
- Patent Title (中): 用于减少基板处理弯月面留下的入口和/或出口痕迹的载体
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Application No.: US11537501Application Date: 2006-09-29
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Publication No.: US07946303B2Publication Date: 2011-05-24
- Inventor: Robert O'Donnell , Eric Lenz , Mark Wilcoxson , Mike Ravkin , Alexander A. Yatskar
- Applicant: Robert O'Donnell , Eric Lenz , Mark Wilcoxson , Mike Ravkin , Alexander A. Yatskar
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Martine Penilla & Gencarella, LLP
- Main IPC: B08B3/04
- IPC: B08B3/04 ; B23Q1/25

Abstract:
A carrier for supporting a substrate during processing by a meniscus formed by upper and lower proximity heads is described. The carrier includes a frame having an opening sized for receiving a substrate and a plurality of support pins for supporting the substrate within the opening. The opening is slightly larger than the substrate such that a gap exists between the substrate and the opening. Means for reducing a size and frequency of entrance and/or exit marks on substrates is provided, the means aiding and encouraging liquid from the meniscus to evacuate the gap. A method for reducing the size and frequency of entrance and exit marks is also provided.
Public/Granted literature
- US20080081775A1 CARRIER FOR REDUCING ENTRANCE AND/OR EXIT MARKS LEFT BY A SUBSTRATE-PROCESSING MENISCUS Public/Granted day:2008-04-03
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