Invention Grant
- Patent Title: Production method of film, and film
- Patent Title (中): 电影和电影的制作方法
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Application No.: US11665757Application Date: 2005-10-13
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Publication No.: US07947330B2Publication Date: 2011-05-24
- Inventor: Kusato Hirota , Yasushi Tateishi
- Applicant: Kusato Hirota , Yasushi Tateishi
- Applicant Address: JP Tokyo
- Assignee: Toray Industries, Inc.
- Current Assignee: Toray Industries, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2004-303931 20041019
- International Application: PCT/JP2005/018863 WO 20051013
- International Announcement: WO2006/043464 WO 20060427
- Main IPC: C23C14/06
- IPC: C23C14/06 ; C23C14/22 ; B32B9/00
Abstract:
A production method of a film of the present invention is a production method of a film, in which after a polymer base is wound off, metal is evaporated, and an oxygen gas is introduced and the inorganic compound layer is formed in an excitation atmosphere of an organic silicon compound containing gas when an inorganic compound layer is formed on the surface of a polymer base. The production method of a film of the present invention can produce a film having a high gas barrier property against an oxygen gas, a water vapor and the like.
Public/Granted literature
- US20080160296A1 Production Method of Film, And Film Public/Granted day:2008-07-03
Information query
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