Invention Grant
US07947521B2 Method for forming electrode for group-III nitride compound semiconductor light-emitting devices 有权
用于形成III族氮化物化合物半导体发光器件的电极的方法

Method for forming electrode for group-III nitride compound semiconductor light-emitting devices
Abstract:
A method for forming an electrode for Group-III nitride compound semiconductor light-emitting devices includes a step of forming a first electrode layer having an average thickness of less than 1 nm on a Group-III nitride compound semiconductor layer, the first electrode layer being made of a material having high adhesion to the Group-III nitride compound semiconductor layer or low contact resistance with the Group-III nitride compound semiconductor layer and also includes a step of forming a second electrode layer made of a highly reflective metal material on the first electrode layer.
Information query
Patent Agency Ranking
0/0