Invention Grant
US07947521B2 Method for forming electrode for group-III nitride compound semiconductor light-emitting devices
有权
用于形成III族氮化物化合物半导体发光器件的电极的方法
- Patent Title: Method for forming electrode for group-III nitride compound semiconductor light-emitting devices
- Patent Title (中): 用于形成III族氮化物化合物半导体发光器件的电极的方法
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Application No.: US12078066Application Date: 2008-03-26
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Publication No.: US07947521B2Publication Date: 2011-05-24
- Inventor: Koichi Goshonoo , Miki Moriyama
- Applicant: Koichi Goshonoo , Miki Moriyama
- Applicant Address: JP Nishikasugai-gun, Aichi-ken
- Assignee: Toyota Gosei Co., Ltd.
- Current Assignee: Toyota Gosei Co., Ltd.
- Current Assignee Address: JP Nishikasugai-gun, Aichi-ken
- Agency: McGinn IP Law Group, PLLC
- Priority: JP2007-082810 20070327
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method for forming an electrode for Group-III nitride compound semiconductor light-emitting devices includes a step of forming a first electrode layer having an average thickness of less than 1 nm on a Group-III nitride compound semiconductor layer, the first electrode layer being made of a material having high adhesion to the Group-III nitride compound semiconductor layer or low contact resistance with the Group-III nitride compound semiconductor layer and also includes a step of forming a second electrode layer made of a highly reflective metal material on the first electrode layer.
Public/Granted literature
- US20080293231A1 Method for forming electrode for Group-III nitride compound semiconductor light-emitting devices Public/Granted day:2008-11-27
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