Invention Grant
- Patent Title: Method of fabricating a mixed microtechnology structure and a structure obtained thereby
- Patent Title (中): 制造混合微技术结构的方法和由此获得的结构
-
Application No.: US11857130Application Date: 2007-09-18
-
Publication No.: US07947564B2Publication Date: 2011-05-24
- Inventor: Marek Kostrzewa , Hubert Moriceau , Marc Zussy
- Applicant: Marek Kostrzewa , Hubert Moriceau , Marc Zussy
- Applicant Address: FR Paris
- Assignee: Commissariat a l'Energie Atomique
- Current Assignee: Commissariat a l'Energie Atomique
- Current Assignee Address: FR Paris
- Agency: Brinks Hofer Gilson & Lione
- Main IPC: H01L21/76
- IPC: H01L21/76

Abstract:
A method of fabricating a mixed microtechnology structure includes providing a provisional substrate including a sacrificial layer on which is formed a mixed layer including at least first patterns of a first material and second patterns of a second material different from the first material, where the first and second patterns reside adjacent the sacrificial layer. The sacrificial layer is removed exposing a mixed surface of the mixed layer, the mixed surface including portions of the first patterns and portions of the second patterns. A continuous is formed covering layer of a third material on the mixed surface by direct bonding.
Public/Granted literature
- US20080079123A1 METHOD OF FABRICATING A MIXED MICROTECHNOLOGY STRUCTUE AND A STRUCTURE OBTAINED THEREBY Public/Granted day:2008-04-03
Information query
IPC分类: