Invention Grant
US07947564B2 Method of fabricating a mixed microtechnology structure and a structure obtained thereby 有权
制造混合微技术结构的方法和由此获得的结构

Method of fabricating a mixed microtechnology structure and a structure obtained thereby
Abstract:
A method of fabricating a mixed microtechnology structure includes providing a provisional substrate including a sacrificial layer on which is formed a mixed layer including at least first patterns of a first material and second patterns of a second material different from the first material, where the first and second patterns reside adjacent the sacrificial layer. The sacrificial layer is removed exposing a mixed surface of the mixed layer, the mixed surface including portions of the first patterns and portions of the second patterns. A continuous is formed covering layer of a third material on the mixed surface by direct bonding.
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