Invention Grant
- Patent Title: Nitride semiconductor device
- Patent Title (中): 氮化物半导体器件
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Application No.: US12046572Application Date: 2008-03-12
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Publication No.: US07947994B2Publication Date: 2011-05-24
- Inventor: Koji Tanizawa , Tomotsugu Mitani , Yoshinori Nakagawa , Hironori Takagi , Hiromitsu Marui , Yoshikatsu Fukuda , Takeshi Ikegami
- Applicant: Koji Tanizawa , Tomotsugu Mitani , Yoshinori Nakagawa , Hironori Takagi , Hiromitsu Marui , Yoshikatsu Fukuda , Takeshi Ikegami
- Applicant Address: JP Anan-shi
- Assignee: Nichia Corporation
- Current Assignee: Nichia Corporation
- Current Assignee Address: JP Anan-shi
- Agency: Volentine & Whitt, PLLC
- Priority: JPP10-060233 19980312; JPP10-161452 19980525; JPP10-284345 19981006; JPP10-326281 19981117; JPP10-348762 19981208; JPP10-368294 19981225; JPP11-023048 19990129; JPP11-023049 19990129
- Main IPC: H01L33/00
- IPC: H01L33/00

Abstract:
According to the nitride semiconductor device with the active layer made of the multiple quantum well structure of the present invention, the performance of the multiple quantum well structure can be brought out to intensify the luminous output thereof thereby contributing an expanded application of the nitride semiconductor device. In the nitride semiconductor device comprises an n-region having a plurality of nitride semiconductor films, a p-region having a plurality of nitride semiconductor films, and an active layer interposed therebetween, a multi-film layer with two kinds of the nitride semiconductor films is formed in at least one of the n-region or the p-region.
Public/Granted literature
- US20080191195A1 NITRIDE SEMICONDUCTOR DEVICE Public/Granted day:2008-08-14
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