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US07948009B2 Nitride semiconductor epitaxial wafer and nitride semiconductor device 有权
氮化物半导体外延晶片和氮化物半导体器件

Nitride semiconductor epitaxial wafer and nitride semiconductor device
Abstract:
A nitride semiconductor epitaxial wafer includes a growth substrate including a surface for growing a nitride semiconductor thereon, a first structure layer formed on the growth substrate, a dislocation propagation direction changing layer formed on the first structure layer for changing a propagation direction of a dislocation propagated in the first structure layer into a lateral direction, a second structure layer formed on the dislocation propagation direction changing layer, and a buffer layer formed on the second structure layer for changing a propagation direction of a dislocation propagated in the second structure layer.
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