Invention Grant
- Patent Title: Immersion lithography apparatus and method of performing immersion lithography
- Patent Title (中): 浸渍光刻设备及其浸渍光刻方法
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Application No.: US12158392Application Date: 2005-12-22
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Publication No.: US07948607B2Publication Date: 2011-05-24
- Inventor: Scott Warrick , Kevin Cooper
- Applicant: Scott Warrick , Kevin Cooper
- Applicant Address: US TX Austin
- Assignee: Freescale Semiconductor, Inc.
- Current Assignee: Freescale Semiconductor, Inc.
- Current Assignee Address: US TX Austin
- International Application: PCT/EP2005/014216 WO 20051222
- International Announcement: WO2007/071280 WO 20070628
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52
Abstract:
An immersion lithography apparatus includes an optical system having a liquid delivery unit. The liquid delivery unit is arranged to deliver a layer of an immersion liquid onto a surface of a wafer as well as an annulus of a barrier liquid adjacent an exterior wall of the immersion liquid. The presence of the barrier liquid prevents ingress to the immersion liquid of a gas external to the immersion liquid.
Public/Granted literature
- US20090002654A1 Immersion Lithography Apparatus and Method of Performing Immersion Lithography Public/Granted day:2009-01-01
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