Invention Grant
- Patent Title: Optical element positioning apparatus, projection optical system and exposure apparatus
- Patent Title (中): 光学元件定位装置,投影光学系统和曝光装置
-
Application No.: US12870877Application Date: 2010-08-30
-
Publication No.: US07948695B2Publication Date: 2011-05-24
- Inventor: Ryo Nawata , Makoto Mizuno , Shigeyuki Uzawa
- Applicant: Ryo Nawata , Makoto Mizuno , Shigeyuki Uzawa
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2007-186924 20070718
- Main IPC: G02B7/02
- IPC: G02B7/02

Abstract:
An optical element is moved in six-degrees-of-freedom. Three first displacement sensors are disposed on a base plate and measure respective displacement amounts of three mutually different points on the optical element in a first direction. A second displacement sensor measures a displacement amount of one point on the optical element in a second direction. Two third displacement sensors measure respective displacement amounts of two mutually different points on the optical element in a third direction. A transformation processor transforms the six measured displacement amounts. A calibration processor calibrates the transformed displacement amounts with a calibration matrix of which coefficients are previously obtained to calibrate the displacement amounts in the six-degrees-of-freedom, which have errors due to measurement errors of the displacement sensors. A controller outputs command values based on differences between the calibrated displacement amounts and target displacement amounts.
Public/Granted literature
- US20100321803A1 Optical Element Positioning Apparatus, Projection Optical System and Exposure Apparatus Public/Granted day:2010-12-23
Information query
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B7/00 | 光学元件的安装、调整装置或不漏光连接 |
G02B7/02 | .用于透镜 |