Invention Grant
US07952048B2 Plasma source with discharge inducing bridge and plasma processing system using the same
有权
等离子体源与放电感应桥和等离子体处理系统使用相同
- Patent Title: Plasma source with discharge inducing bridge and plasma processing system using the same
- Patent Title (中): 等离子体源与放电感应桥和等离子体处理系统使用相同
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Application No.: US11438691Application Date: 2006-05-23
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Publication No.: US07952048B2Publication Date: 2011-05-31
- Inventor: Dae-Kyu Choi , Soon-Im Wi
- Applicant: Dae-Kyu Choi , Soon-Im Wi
- Applicant Address: KR Suwon-si
- Assignee: New Power Plasma Co., Ltd.
- Current Assignee: New Power Plasma Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: NSIP Law
- Priority: KR10-2005-0043232 20050523; KR10-2005-0051638 20050615; KR10-2006-0015143 20060216; KR10-2006-0042062 20060510; KR10-2006-0042073 20060510
- Main IPC: H05B10/00
- IPC: H05B10/00

Abstract:
A plasma source with discharge inducing bridges and a plasma processing system using the same. The plasma source may be constructed with a number of discharge inducing bridges, each discharge inducing bridge containing a magnetic core with a primary winding of a transformer. The discharge inducing bridges are positioned so as to face a susceptor. Each discharge inducing bridge is a hollow tube. When the electrical current of the primary winding of the transformer is driven, magnetic flux is induced to the magnetic core, so that inductive coupled plasma is formed around the discharge inducing bridges, and a plasma discharge is evenly induced horizontally/vertically along the discharge inducing bridges, so that uniform large-area high-density plasma is generated.
Public/Granted literature
- US20060289409A1 Plasma source with discharge inducing bridge and plasma processing system using the same Public/Granted day:2006-12-28
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