Invention Grant
- Patent Title: Sample preparation system
- Patent Title (中): 样品制备系统
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Application No.: US11876033Application Date: 2007-10-22
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Publication No.: US07952082B2Publication Date: 2011-05-31
- Inventor: Hideo Sugizaki
- Applicant: Hideo Sugizaki
- Applicant Address: JP Tokyo
- Assignee: JEOL Ltd.
- Current Assignee: JEOL Ltd.
- Current Assignee Address: JP Tokyo
- Agency: The Webb Law Firm
- Priority: JP2006-291012 20061026
- Main IPC: G21G5/00
- IPC: G21G5/00

Abstract:
A sample preparation system in which an ion beam is made to hit the surface of a sample while rotating the sample about an axis perpendicular to the processed surface of the sample under the condition where the processed surface of the sample is not perpendicular to the beam. The preparation system has a rotating mechanism and a tilting mechanism both of which are mounted in an enclosure mounted to the vacuum chamber. The rotating mechanism rotates the holder about the X-axis perpendicular to the surface of the holder on which the sample is placed. The tilting mechanism tilts the holder about the Y-axis perpendicular to the X-axis.
Public/Granted literature
- US20080099695A1 Sample Preparation System Public/Granted day:2008-05-01
Information query
IPC分类:
G | 物理 |
G21 | 核物理;核工程 |
G21G | 化学元素的转变;放射源 |
G21G5/00 | 通过化学反应进行化学元素的推断转变 |