Invention Grant
US07952726B2 Measurement apparatus, exposure apparatus having the same, and device manufacturing method 失效
测量装置,具有该测量装置的曝光装置和装置制造方法

Measurement apparatus, exposure apparatus having the same, and device manufacturing method
Abstract:
A measurement apparatus includes a first mask that is arranged on an object plane of a target optical system, and has a window that transmits measurement light, a second mask that has a reflection surface for reducing coherence of the measurement light, and a diffraction grating configured to split the measurement light that has been reflected on the second mask, has passed the first mask and the target optical system, wherein a distance Lg between the diffraction grating and an image plane of the target optical system satisfies Lg=m·Pg2/λ where Pg is a grating pitch of the diffraction grating, λ is a wavelength of the measurement light, and m is an integer except for 0.
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