Invention Grant
US07952726B2 Measurement apparatus, exposure apparatus having the same, and device manufacturing method
失效
测量装置,具有该测量装置的曝光装置和装置制造方法
- Patent Title: Measurement apparatus, exposure apparatus having the same, and device manufacturing method
- Patent Title (中): 测量装置,具有该测量装置的曝光装置和装置制造方法
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Application No.: US12280926Application Date: 2007-02-28
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Publication No.: US07952726B2Publication Date: 2011-05-31
- Inventor: Seima Kato , Chidane Ouchi
- Applicant: Seima Kato , Chidane Ouchi
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2006-051426 20060228
- International Application: PCT/JP2007/054373 WO 20070228
- International Announcement: WO2007/100144 WO 20070907
- Main IPC: G01B9/02
- IPC: G01B9/02 ; G03B27/54

Abstract:
A measurement apparatus includes a first mask that is arranged on an object plane of a target optical system, and has a window that transmits measurement light, a second mask that has a reflection surface for reducing coherence of the measurement light, and a diffraction grating configured to split the measurement light that has been reflected on the second mask, has passed the first mask and the target optical system, wherein a distance Lg between the diffraction grating and an image plane of the target optical system satisfies Lg=m·Pg2/λ where Pg is a grating pitch of the diffraction grating, λ is a wavelength of the measurement light, and m is an integer except for 0.
Public/Granted literature
- US20100190115A1 MEASUREMENT APPARATUS, EXPOSURE APPARATUS HAVING THE SAME, AND DEVICE MANUFACTURING METHOD Public/Granted day:2010-07-29
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