Invention Grant
US07953884B2 Method and apparatus for overload control and audit in a resource control and management system
有权
资源控制和管理系统中过载控制和审计的方法和装置
- Patent Title: Method and apparatus for overload control and audit in a resource control and management system
- Patent Title (中): 资源控制和管理系统中过载控制和审计的方法和装置
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Application No.: US11784710Application Date: 2007-04-09
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Publication No.: US07953884B2Publication Date: 2011-05-31
- Inventor: Anjana Agarwal , Craig R. Lothridge , Maridi Raju Makaraju , Jakob J. Neulist , Sam X. Tao
- Applicant: Anjana Agarwal , Craig R. Lothridge , Maridi Raju Makaraju , Jakob J. Neulist , Sam X. Tao
- Applicant Address: US NJ Murray Hill
- Assignee: Alcatel-Lucent USA Inc.
- Current Assignee: Alcatel-Lucent USA Inc.
- Current Assignee Address: US NJ Murray Hill
- Agency: Fay Sharpe LLP
- Main IPC: G06F15/16
- IPC: G06F15/16
Abstract:
A system and method for resource control management implementing Diameter protocol is disclosed. The system includes a border gateway which is configured to send an overload message and a controller that is acting as a Diameter protocol server which is configured to receive the overload message and block a number of calls to the border gateway. The controller would also be configured to perform an audit function which includes clearing media resource ports. The overload message sent by the border gateway may also include a reduction percentage, which will dictate the percentage of calls which will be blocked.
Public/Granted literature
- US20080250156A1 Method and apparatus for overload control and audit in a resource control and management system Public/Granted day:2008-10-09
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