Invention Grant
- Patent Title: Droplet discharging head and method for manufacturing the same, and droplet discharging device
- Patent Title (中): 液滴喷头及其制造方法和液滴喷射装置
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Application No.: US11842526Application Date: 2007-08-21
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Publication No.: US07954925B2Publication Date: 2011-06-07
- Inventor: Yasuto Shimura
- Applicant: Yasuto Shimura
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2006-281134 20061016
- Main IPC: B41J2/14
- IPC: B41J2/14 ; B41J2/16
Abstract:
A droplet discharging head comprises: a pressure chamber; a nozzle plate including a penetration part that couples with the pressure chamber and discharges a droplet; and a droplet guidance part having a tip positioned inside the penetration part. The tip of the droplet guidance part is free from touching an inside wall of the penetration part.
Public/Granted literature
- US20080088669A1 DROPLET DISCHARGING HEAD AND METHOD FOR MANUFACTURING THE SAME, AND DROPLET DISCHARGING DEVICE Public/Granted day:2008-04-17
Information query
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