Invention Grant
- Patent Title: Laterally insertable interspinous process implant
- Patent Title (中): 可以插入椎间植入植入物
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Application No.: US11067982Application Date: 2005-02-28
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Publication No.: US07955356B2Publication Date: 2011-06-07
- Inventor: James F. Zucherman , Ken Y. Hsu , Henry A. Klyce
- Applicant: James F. Zucherman , Ken Y. Hsu , Henry A. Klyce
- Applicant Address: CH Neuchatel
- Assignee: Kyphon SARL
- Current Assignee: Kyphon SARL
- Current Assignee Address: CH Neuchatel
- Agency: Coats and Bennett, P.L.L.C.
- Main IPC: A61B17/70
- IPC: A61B17/70

Abstract:
A laterally insertable spine distraction implant alleviates pain associated with spinal stenosis and facet arthropathy and other spinal ailments by expanding the volume in the spine canal and/or neural foramen. The implant provides a deployable second arm that converts between a first position for insertion and a second position for retention of the implant between adjacent spinous processes.
Public/Granted literature
- US20050143738A1 Laterally insertable interspinous process implant Public/Granted day:2005-06-30
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