Invention Grant
- Patent Title: Phase modulation device, phase modulation device fabrication method, crystallization apparatus, and crystallization method
- Patent Title (中): 相位调制装置,相位调制装置制造方法,结晶装置和结晶方法
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Application No.: US11523567Application Date: 2006-09-20
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Publication No.: US07955432B2Publication Date: 2011-06-07
- Inventor: Hiroyuki Ogawa , Masato Hiramatsu
- Applicant: Hiroyuki Ogawa , Masato Hiramatsu
- Applicant Address: JP Yokohama-shi
- Assignee: Advanced LCD Technologies Development Center Co., Ltd.
- Current Assignee: Advanced LCD Technologies Development Center Co., Ltd.
- Current Assignee Address: JP Yokohama-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2005-275867 20050922
- Main IPC: C30B1/02
- IPC: C30B1/02

Abstract:
A phase shifter which modulates the phase of incident light has a light-transmitting substrate such as a glass substrate, and a phase modulator such as a concavity and convexity pattern which is formed on the laser beam incident surface of the light-transmitting substrate and modules the phase of incident light. A light-shielding portion which shields light in the peripheral portion where the optical intensity distribution decreases of the phase modulator is formed on the laser beam incident surface or exit surface of the phase shifter, thereby shielding the peripheral light in the irradiation surface of the incident laser beam.
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