Invention Grant
- Patent Title: Method of and apparatus for manufacturing polarization plate
- Patent Title (中): 偏光板制造方法及设备
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Application No.: US11663200Application Date: 2005-03-25
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Publication No.: US07955466B2Publication Date: 2011-06-07
- Inventor: Atsuo Nozaki
- Applicant: Atsuo Nozaki
- Applicant Address: JP Tokyo JP Tokyo JP Tokyo JP Tokyo JP Tokyo JP Tokyo
- Assignee: JRS Corporation,Sumitomo Chemical Co., Ltd.,Dai Nippon Printing Co., Ltd.,Toppan Printing Co., Ltd.,NEC Corporation,Hitachi Chemical Co., Ltd.
- Current Assignee: JRS Corporation,Sumitomo Chemical Co., Ltd.,Dai Nippon Printing Co., Ltd.,Toppan Printing Co., Ltd.,NEC Corporation,Hitachi Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo JP Tokyo JP Tokyo JP Tokyo JP Tokyo JP Tokyo
- Agency: Flynn, Thiel, Boutell & Tanis, P.C.
- International Application: PCT/JP2005/005485 WO 20050325
- International Announcement: WO2006/103715 WO 20061005
- Main IPC: B29C65/00
- IPC: B29C65/00 ; B32B37/00
Abstract:
When a polarization plate is manufactured by laminating and laminating at least two types of retarder films onto a polarizer film by a laminating apparatus, with the two films of at least the two types of retarder films and at least the polarizer films being laminated such that the difference in the angle between the feeding directions of the two films is within the range of 40° to 80°. With this arrangement, a good handling property can be obtained, improvement in yield ratio can be expected, and the installation area of the laminating apparatus can be reduced due to a reduction in size of the laminating apparatus.
Public/Granted literature
- US20090205773A1 Method of and apparatus for manufacturing polarization plate Public/Granted day:2009-08-20
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