Invention Grant
- Patent Title: Method and apparatus for treating gas containing flourine-containing compounds
- Patent Title (中): 含有含氟化合物的气体处理方法和装置
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Application No.: US10593312Application Date: 2005-03-18
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Publication No.: US07955578B2Publication Date: 2011-06-07
- Inventor: Yoichi Mori , Tadakazu Nishikawa , Masaaki Osato , Saburou Nagano , Yoshihiro Tanabe
- Applicant: Yoichi Mori , Tadakazu Nishikawa , Masaaki Osato , Saburou Nagano , Yoshihiro Tanabe
- Applicant Address: JP Tokyo
- Assignee: Ebara Corporation
- Current Assignee: Ebara Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2004-080249 20040319
- International Application: PCT/JP2005/005627 WO 20050318
- International Announcement: WO2005/089909 WO 20050929
- Main IPC: B01D53/62
- IPC: B01D53/62 ; B01D53/68 ; B01D53/70 ; C01F11/22

Abstract:
To provide a method and apparatus for treating a waste gas containing fluorine-containing compounds, according to which PFCs can be decomposed efficiently even at low temperature, and moreover fluorine from the product of the decomposition can be recovered for reuse efficiently. An embodiment of the present invention relates to a method of treating a gas containing a fluorine-containing compound, comprising contacting the gas with a treatment agent comprising a mixture of aluminum hydroxide and calcium hydroxide. Moreover, another embodiment of the present invention relates to an apparatus for treating a gas containing a fluorine-containing compound, comprising a treatment column comprising a hollow interior that is packed with a treatment agent comprising a mixture of aluminum hydroxide and calcium hydroxide and through which the gas can pass, heating means capable of heating the hollow interior to a prescribed temperature, a gas introduction port for introducing the gas to be treated into the hollow interior, and an exhaust pipe for discharging gas produced from the hollow interior.
Public/Granted literature
- US20070264188A1 Method and Apparatus for Treating Gas Containing Flourine-Containing Compounds Public/Granted day:2007-11-15
Information query
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