Invention Grant
- Patent Title: PVD cylindrical target
- Patent Title (中): PVD圆柱形靶
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Application No.: US11755318Application Date: 2007-05-30
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Publication No.: US07955673B2Publication Date: 2011-06-07
- Inventor: Toshiaki Takao , Takahiro Okazaki , Hirofumi Fujii
- Applicant: Toshiaki Takao , Takahiro Okazaki , Hirofumi Fujii
- Applicant Address: JP Kobe-shi
- Assignee: Kobe Steel, Ltd.
- Current Assignee: Kobe Steel, Ltd.
- Current Assignee Address: JP Kobe-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-179874 20060629
- Main IPC: B32B1/08
- IPC: B32B1/08 ; B32B27/00

Abstract:
The present invention provides a PVD cylindrical target comprising an evaporation material covering the outer circumferential surface of a cylindrical substrate, the PVD cylindrical target includes a meshing part having at least either of a protruding shape and a recessed shape formed with rounded angular parts at the interface between the substrate and the evaporation material. According to such a structure, peeling or cracking of the evaporation material by a residual stress caused at the interface between the substrate and the evaporation material by a thermal expansion difference between the both can be suppressed, and sufficient adhesiveness between the both can also be ensured.
Public/Granted literature
- US20080003385A1 PVD CYLINDRICAL TARGET Public/Granted day:2008-01-03
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