Invention Grant
- Patent Title: Software-controlled maskless optical lithography using fluorescence feedback
- Patent Title (中): 使用荧光反馈的软件无掩模光刻技术
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Application No.: US12649620Application Date: 2009-12-30
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Publication No.: US07955766B2Publication Date: 2011-06-07
- Inventor: Ioannis Kymissis
- Applicant: Ioannis Kymissis
- Applicant Address: US NY New York
- Assignee: The Trustees of Columbia University in the City of New York
- Current Assignee: The Trustees of Columbia University in the City of New York
- Current Assignee Address: US NY New York
- Agency: Schwegman, Lundberg & Woessner, P.A.
- Main IPC: G03F9/00
- IPC: G03F9/00 ; G03B27/52
Abstract:
A software-controlled maskless optical lithography system uses fluorescence feedback to control an aspect of the lithography, such as light source dose, wavelength, or flashing instances or duration, spatial light modulator (SLM) pattern, an optics parameter, a beamsplitter control parameter, or movement or positioning of a stage carrying a target workpiece, such as a semiconductor wafer.
Public/Granted literature
- US20100248099A1 SOFTWARE-CONTROLLED MASKLESS OPTICAL LITHOGRAPHY USING FLUORESCENCE FEEDBACK Public/Granted day:2010-09-30
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