Invention Grant
- Patent Title: Photopolymer composition suitable for lithographic printing plates
- Patent Title (中): 适用于平版印刷版的光聚合物组合物
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Application No.: US11995213Application Date: 2006-07-03
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Publication No.: US07955776B2Publication Date: 2011-06-07
- Inventor: Harald Baumann , Bernd Strehmel , Detlef Pietsch , Udo Dwars , Tanja Ebhardt , Axel Draber
- Applicant: Harald Baumann , Bernd Strehmel , Detlef Pietsch , Udo Dwars , Tanja Ebhardt , Axel Draber
- Applicant Address: US NY Rochester
- Assignee: Eastman Kodak Company
- Current Assignee: Eastman Kodak Company
- Current Assignee Address: US NY Rochester
- Agent J. Lanny Tucke
- Priority: DE102005033971 20050720
- International Application: PCT/EP2006/006462 WO 20060703
- International Announcement: WO2007/009580 WO 20070125
- Main IPC: G03F7/26
- IPC: G03F7/26 ; G03F7/00

Abstract:
Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X1, X2 and X3 are independently selected from straight-chain or cyclic C4-C12 alkylene and C6-C10 arylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R1, R2 and R3 are independently selected from (II) and (III) with the proviso that (1) n=0 in at least one of the groups R1, R2 and R3, and (2) n>2 in at least one of the groups R1, R2 and R3, and (3) at least one group R6 is different from H in formula (III).
Public/Granted literature
- US20080248424A1 Photopolymer Composition Suitable for Lithographic Printing Plates Public/Granted day:2008-10-09
Information query
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