Invention Grant
- Patent Title: Compositions and processes for photolithography
- Patent Title (中): 光刻的组成和工艺
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Application No.: US12454516Application Date: 2009-05-19
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Publication No.: US07955778B2Publication Date: 2011-06-07
- Inventor: Michael K. Gallagher , Deyan Wang
- Applicant: Michael K. Gallagher , Deyan Wang
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agent Jonathan D. Baskin
- Main IPC: G03C1/492
- IPC: G03C1/492 ; G03C1/494 ; G03C1/76 ; G03C5/00
Abstract:
Overcoating layer compositions are provided that are applied above a photoresist composition including for immersion lithography processing as well as non-immersion imaging.
Public/Granted literature
- US20090233224A1 Compositions and processes for photolithography Public/Granted day:2009-09-17
Information query
