Invention Grant
US07955779B2 Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s
有权
具有耐溶剂性聚（乙烯醇缩醛）的辐射敏感组合物和元素
- Patent Title: Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s
- Patent Title (中): 具有耐溶剂性聚（乙烯醇缩醛）的辐射敏感组合物和元素
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Application No.: US12545297Application Date: 2009-08-21
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Publication No.: US07955779B2Publication Date: 2011-06-07
- Inventor: Moshe Levanon , Emmanuel Lurie , Vladimir Kampel
- Applicant: Moshe Levanon , Emmanuel Lurie , Vladimir Kampel
- Applicant Address: US NY Rochester
- Assignee: Eastman Kodak Company
- Current Assignee: Eastman Kodak Company
- Current Assignee Address: US NY Rochester
- Agent J. Lanny Tucker
- Main IPC: G03F7/004
- IPC: G03F7/004
Abstract:
A radiation-sensitive composition can be used to prepare positive-working imageable elements having improved solvent resistance and is useful for making lithographic printing plates. The composition includes an alkaline soluble polymeric binder that is a specific poly(vinyl acetal) that exhibits improved resistance to press chemicals, and a radiation absorbing compound.
Public/Granted literature
- US20090311626A1 RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS WITH SOLVENT RESISTANT POLY(VINYL ACETAL)S Public/Granted day:2009-12-17
Information query
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