Invention Grant
US07955782B2 Bottom antireflective coatings exhibiting enhanced wet strip rates, bottom antireflective coating compositions for forming bottom antireflective coatings, and methods for fabricating the same
有权
表现出增强的湿条带率的底部抗反射涂层，用于形成底部抗反射涂层的底部抗反射涂料组合物及其制造方法
- Patent Title: Bottom antireflective coatings exhibiting enhanced wet strip rates, bottom antireflective coating compositions for forming bottom antireflective coatings, and methods for fabricating the same
- Patent Title (中): 表现出增强的湿条带率的底部抗反射涂层，用于形成底部抗反射涂层的底部抗反射涂料组合物及其制造方法
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Application No.: US12234849Application Date: 2008-09-22
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Publication No.: US07955782B2Publication Date: 2011-06-07
- Inventor: Sudip Mukhopadhyay , Joseph Kennedy , Yamini Pandey , Jelena Sepa
- Applicant: Sudip Mukhopadhyay , Joseph Kennedy , Yamini Pandey , Jelena Sepa
- Applicant Address: US NJ Morristown
- Assignee: Honeywell International Inc.
- Current Assignee: Honeywell International Inc.
- Current Assignee Address: US NJ Morristown
- Agency: Ingrassia Fisher & Lorenz, P.C.
- Main IPC: G03F7/11
- IPC: G03F7/11
Abstract:
Bottom antireflective coating (BARC) that exhibit enhanced wet strip rates, BARC compositions for fabricating such BARCs, and methods for manufacturing such BARC compositions are provided. According to one exemplary embodiment, a bottom antireflective coating (BARC) composition comprises an inorganic-based compound, an absorbing material, and a wet strip-rate modifier combination. The wet strip-rate modifier composition comprises a combination of a short chain linear alcohol and dipropylene glycol (DPG), a combination of the short chain linear alcohol and tetraethylene glycol (TEG), a combination of DPG and TEG, or a combination of the short chain linear alcohol, DPG, and TEG.
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